| 開講学期／Course Start | 2018年度／Academic Year 後期／Second |
|---|---|
| 開講曜限／Class period | 火/Tue 5,火/Tue 6,水/Wed 5,水/Wed 6 |
| 授業区分／Regular or Intensive | 週間授業 |
| 対象学科／Department | 情報電子工学系専攻電子デバイス計測コース |
| 対象学年／Year | 1年,2年 |
| 授業科目区分／Category | 博士前期課程 大学院自専攻科目 |
| 必修・選択／Mandatory or Elective | 選択 |
| 授業方法／Lecture or Seminar | 講義 |
| 授業科目名／Course Title | プラズマ工学特論 |
| 単位数／Number of Credits | 2.0 |
| 担当教員名／Lecturer | 植杉克弘(情報電子工学系学科電気電子工学コース) |
| 時間割コード／Registration Code | MQ302B |
| 連絡先／Contact | 植杉克弘(Y701室，TEL:0143-46-5546，E-mail:uesugi@mmm.muroran-it.ac.jp) |
| オフィスアワー／Office hours | 植杉克弘(月曜日 12:00～13:00，木曜日 12:00～13:00) |
| 更新日／Date of renewal | 2018/09/12 |
|---|---|
| 授業のねらい ／Learning Objectives |
プラズマプロセスは電子機器で用いられている集積回路を作製ために必要不可欠な技術である．この授業では,化学的に高い反応性をもつプラズマ放電の基本的な原理と,そのマイクロエレクトロニクスへの応用について学ぶ． Plasma processes are indispensable for manufacturing the integrated circuits used by the electronic equipment. This course will provide the fundamental principles of chemical reactive plasma discharges and applications in microelectronics. The fundamental physical and chemical properties of plasma and thin-film processing such as surface etching and deposition will be studied. |
| 到達度目標 ／Outcomes Measured By: |
Understandings of fundamental principles of partially ionized plasma discharges, typical plasma sources used by the electronics industry, and applications in microelectronics. |
| 授業計画 ／Course Schedule |
1. Introduction 2. Plasma fundamentals 3. Basic plasma equations and equilibrium (I) 4. Basic plasma equations and equilibrium (II) 5. Atomic collisions (I) 6. Atomic collisions (II) 7. Plasma dynamics (I) 8. Plasma dynamics (II) 9. Etching (I) 10. Etching (II) 11. Deposition (I) 12. Deposition (II) 13. Implantation (I) 14. Implantation (II) 15. Applications in microelectronics 総授業時間数：22.5時間 |
| 参考書等 ／Required Materials |
Principles of plasma discharges and materials processing Michael A. Lieberman, Allan J. Lichtenberg Wiley-Interscience 2005(ISBN:9780471720010)
Lecture notes on principles of plasma processing Francis F. Chen and Jane P. Chang Kluwer Academic/Plenum Publishers 2002(ISBN:9780306474972) |
| 教科書・参考書に関する備考 | No text book. The stuff for presentation is delivered in every class. |
| 成績評価方法 ／Grading Guidelines |
The score of each student is evaluated by presentations and reports. A grade of more than 60 is accepted for a credit. |
| 学習・教育目標との対応 ／Learning and Educational Policy |
This class corresponds to the learning of specialized knowledge pertaining to electrical-energy techniques. |
| 備考 ／Notes |
授業の一部は英語（資料配付，板書，口頭説明）を行うが，基本的には日本語とする． Japanese language is mainly used for this lecture, however, reference materials, writing on blackboard, and oral presentation in English are provided briefly. |
| No. | 回（日時） ／Time (date and time) |
主題と位置付け（担当） ／Subjects and instructor's position |
学習方法と内容 ／Methods and contents |
備考 ／Notes |
|---|---|---|---|---|
| 該当するデータはありません | ||||
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Active learning 1-1 ／主体的学修（予復習，反転授業，小テスト，振り返り 等） |
Enough preparation for the lecture is required. |
|---|---|
|
Active learning 1-2 ／上記項目に係るALの度合い |
15%未満 |
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Active learning 2-1 ／対話的学修（グループ学習，協働，調査体験 等） |
The presentation is required for the research contents. |
|
Active learning 2-2 ／上記項目に係るALの度合い |
15%未満 |
|
Active learning 3-1 ／深い学修（複数科目の知識の総合化や問題解決型学修 等） |
|
|
Active learning 3-2 ／上記項目に係るALの度合い |
該当なし |