開講学期 Course Start	2013年度 後期
授業区分 Regular or Intensive	週間授業
対象学科 Department	情報電子工学系専攻
対象学年 Year	1
必修・選択 Mandatory or Elective	選択
授業方法 Lecture or Seminar	講義および演習
授業科目名 Course Title	プラズマエレクトロニクス特論
単位数 Number of Credits	2
担当教員 Lecturer	植杉克弘
教員室番号 Office	Y701
連絡先(Tel) Telephone	0143-46-5546
連絡先(E-mail) E-mail	uesugi＠mmm.muroran-it.ac.jp
オフィスアワー Office Hour	Monday 12:00-13:00, Thursday 12:00-13:00.
授業のねらい Learning Objectives	Plasma processes are indispensable for manufacturing the integrated circuits used by the electronic equipment. This course will provide the fundamental principles of chemical reactive plasma discharges and applications in microelectronics. The fundamental physical and chemical properties of plasma and thin-film processing such as surface etching and deposition will be studied.
到達度目標 Outcomes Measured By:	Understandings of fundamental principles of partially ionized plasma discharges, typical plasma sources used by the electronics industry, and applications in microelectronics.
授業計画 Course Schedule	Total number of class hours: 24 h Course plan: 1. Introduction 2. Materials processing 3. Plasma Fundamentals 4. Radio Frequency diodes 5. High-density sources 6. Basic plasma equations 7. Equilibrium properties 8. Atomic collisions 9. Plasma dynamics 10. Plasma etching 11. Etching kinetics 12. Etching of Silicon 13. Plasma-enhanced chemical vapor deposition 14. Plasma-immersion ion implantation 15. Applications in Microelectronics 16. Examination
教科書 Required Text	No text book. Relevant materials will be provided.
参考書 Required Materials
教科書・参考書に関する備考
成績評価方法 Grading Guidelines	The score of each student is evaluated by presentations (50%) and examination (50%).
履修上の注意 Please Note	A grade of more than 60 is accepted for a credit.
教員メッセージ Message from Lecturer
学習・教育目標との対応 Learning and Educational Policy
関連科目 Associated Courses
備考 Remarks	This subject will be taught in Japanese and partially in English.